SAN JOSE, Calif. – Japan's Toppan Printing Co. Ltd. has developed a photomask manufacturing process at its facility in Asaka, Japan, to support 22- and 20-nm semiconductor device production. This ...

TOKYO--(BUSINESS WIRE)--Dai Nippon Printing Co., Ltd. (DNP, TOKYO: 7912) has begun development of a photomask manufacturing for 2-nanometer (10-9 meter) generation logic semiconductors that support ...

TOKYO, Sept. 09, 2025 (GLOBE NEWSWIRE) -- Leading semiconductor test equipment supplier Advantest Corporation (TSE: 6857) today announced the release of its next-generation CD-SEM* E3660, engineered ...

The semiconductor industry is making noticeable progress on the development of advanced curvilinear photomasks, a technology that has broad implications for chip designs at the most advanced nodes and ...

A surge in demand for chips at mature nodes, coupled with aging photomask-making equipment at those geometries, are causing significant concern across the supply chain. These issues began to surface ...

HSINCHU, Taiwan — Foundry chipmaker United Microelectronics Corp. said Thursday (December 4, 2003) that it has begun using chrome-less phase-shift masks within its 90-nm manufacturing process. UMC is ...

Making computer chips smaller and more powerful is not just about clever engineering. It also depends on improving the ...