Intel announced that it had installed ASML's Twinscan EXE:5200B, the industry's first High-NA lithography tool with 0.55 numerical aperture projection optics made for commercial chip production. The ...

Intel fell behind TSMC in the process race over the past decade. It plans to reclaim that lead by adopting ASML’s high-NA systems first. That’s a costly effort, but it might pay off in the long run.

Intel's foundry arm says it has crossed a major lithography milestone: it has announced successful acceptance testing of ASML's TWINSCAN EXE:5200B High Numerical Aperture (High-NA) EUV scanner, one of ...

These are the most-read DIGITIMES Asia stories in the week of December 15 to December 21, 2025. 'Father of Immersion Lithography' warns: Intel's TSMC talent grab invites process tech scrutiny Intel's ...